.Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE[J].Optoelectronics Letters,2007,3(2):88-90 Investigation of nanometer-scale films using low angle X-ray reflectivity analysis in IPOE WANG Zhan-shan(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; XU Yao(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; WANG Hong-chang(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; ZHU Jing-tao(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; ZHANG Zhong(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; WANG Feng-li(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; CHEN Ling-yan(Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China) ; Abstract:       The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters ofnanometer-scale structures,three effectual methods are presented by using X-ray reflectivity analysis to provide an accurateestimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density,interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measurethe profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis. Hits: 3478 Download times: 199 View Full Text    Download reader