.Application of UV depth lithography in micro system technology[J].Optoelectronics Letters,2008,4(1):1-4 |
Application of UV depth lithography in micro system technology |
Stephanus Büttgenbach |
Stephanus Büttgenbach(Institute for Microtechnology, Technical University of Braunschweig Langer Kamp 8, 38106 Braunschweig, Germany) ;
Marco Feldmann(Institute for Microtechnology, Technical University of Braunschweig Langer Kamp 8, 38106 Braunschweig, Germany) ; |
Abstract: |
This letter reports on new types of photo resists allowing UV-light exposure of thick layers. Optimized processes Cthat for the positive resistAZ 9260 and the negative resist Epon SU-8 have been developed enabling the fabrication of high aspect ratio metallic and polymer micro components. The high potential of this technology will be demonstrated on the basis of two examples, a variable reluctance micro motor with compensated attractive force and an optical microphone developed for application in electro-magnetic interference en environments. |
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