| Meng Zeng-you,Huang Sha-ling,Liu Zhe,Zeng Cheng-hang,Bu Yi-kun.Design and fabrication of a novel high damage threshold HfO2/TiO2/SiO2 multilayer laser mirror[J].Optoelectronics Letters,2012,8(3):190-192 |
| Design and fabrication of a novel high damage threshold HfO2/TiO2/SiO2 multilayer laser mirror |
| Author Name | Affiliation | | Meng Zeng-you | Department of Electronic Engineering, Xiamen University, Xiamen 361005, China | | Huang Sha-ling | Department of Electronic Engineering, Xiamen University, Xiamen 361005, China | | Liu Zhe | Department of Electronic Engineering, Xiamen University, Xiamen 361005, China | | Zeng Cheng-hang | Department of Electronic Engineering, Xiamen University, Xiamen 361005, China | | Bu Yi-kun | Department of Electronic Engineering, Xiamen University, Xiamen 361005, China |
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| Abstract: |
| This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laserinduced
damage threshold. The mirror is constructed by three materials of HfO2/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO2/SiO2 stacks act as the high reflector (HR) and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO2/TiO2/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage
probability for the new mirror is up to 39.6 J/cm2 (1064 nm, 12 ns). The possible laser damage mechanism of the mirror is discussed. |
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| This work has been supported by the National Natural Science Foundation of China (No.50802080) and the Natural Science Foundation of Fujian
Province of China (No.2010J01349). |
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